Improved polysilicon surface-micromachined micromirror devices using chemical-mechanical polishing

被引：9

作者：

Hetherington, DL ^{[1
]}

Sniegowski, JJ ^{[1
]}

机构：

[1] Sandia Natl Labs, Albuquerque, NM 87185 USA

来源：

PHOTONICS FOR SPACE ENVIRONMENTS VI | 1998年 / 3440卷

关键词：

micro-optical components; micromirrors; planarization; chemical-mechanical polishing; CMP; adaptive optics; optical MEMS;

D O I：

10.1117/12.326692

中图分类号：

V [航空、航天];

学科分类号：

08 ; 0825 ;

摘要：

Surface polysilicon micromachined micromirrors require ultra-flat surfaces for advance optical applications such as adaptive optics. This paper details the planarization of micromirrors using chemical-mechanical polishing. We show that the increase in topography is due to a high temperature anneal step downstream From the CMP process itself. Two process alternatives were investigated: (I) perform a CMP step after the high temperature anneal step, and (2) perform a CMP step on the final polysilicon mirror surface. Both process alternatives produced acceptable flatness requirements for micromirror applications.

引用

页码：148 / 153

页数：6

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