Fabrication of submicron- or nano-sized mesa electrodes via AFM oxidation: Applications to metal ion detection

被引:13
作者
Kim, Y
Choi, I
Kang, SK
Choi, K
Yi, JH [1 ]
机构
[1] Seoul Natl Univ, Inst Chem Proc, Sch Chem & Biol Engn, Seoul 151742, South Korea
[2] Natl Inst Environm Res, Minist Environm, Inchon 404170, South Korea
关键词
AFM; etching; lithography; metal ion detection; patterning;
D O I
10.1016/j.mee.2005.03.029
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Conductive probe AFM local oxidation is a promising lithographic technique for use in fabricating submicron- or nano-scale structures. In this study, a metal ion detector with a submicron size electrode was fabricated by AFM lithography using a pre-programmed voltage and a non-etching method. The square frame of the mesa pattern was functionalized by APTES for the metal ion detection, and the remaining portion was used as an electrode by the self-assembly of MPTMS for Au metal deposition. In this module, no metal lining or lead line was required, because the conductive tip (mobile electrode) was in direct contact with the gold-deposited mesa portion (fixed electrode). The conductance changed with the quantity of adsorbed copper ions, due to electron tunneling between the mobile and surface electrodes. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:341 / 348
页数:8
相关论文
共 17 条
  • [1] Atkins P.W., 1994, Physical Chemistry, V5th ed.
  • [2] AFM induced formation of SiO2 structures in the electrochemical nanocell
    Bloess, H
    Staikov, G
    Schultze, JW
    [J]. ELECTROCHIMICA ACTA, 2001, 47 (1-2) : 335 - 344
  • [3] A fluorescence nanosensor for Cu2+ on silica particles
    Brasola, E
    Mancin, F
    Rampazzo, E
    Tecilla, P
    Tonellato, U
    [J]. CHEMICAL COMMUNICATIONS, 2003, (24) : 3026 - 3027
  • [4] Nanometer-scale conversion of Si3N4 to SiOx
    Chien, FSS
    Chang, JW
    Lin, SW
    Chou, YC
    Chen, TT
    Gwo, S
    Chao, TS
    Hsieh, WF
    [J]. APPLIED PHYSICS LETTERS, 2000, 76 (03) : 360 - 362
  • [5] Nanomachining of (110)-oriented silicon by scanning probe lithography and anisotropic wet etching
    Chien, FSS
    Wu, CL
    Chou, YC
    Chen, TT
    Gwo, S
    Hsieh, WF
    [J]. APPLIED PHYSICS LETTERS, 1999, 75 (16) : 2429 - 2431
  • [6] THIN-FILM POLYMERIC SENSORS FOR DETECTION AND QUANTIFICATION OF MULTIVALENT METAL-IONS
    EDLUND, DJ
    FRIESEN, DT
    MILLER, WK
    THORNTON, CA
    WEDEL, RL
    RAYFIELD, GW
    LOWELL, JR
    [J]. SENSORS AND ACTUATORS B-CHEMICAL, 1993, 10 (03) : 185 - 190
  • [7] CONTROLLED NUCLEATION FOR REGULATION OF PARTICLE-SIZE IN MONODISPERSE GOLD SUSPENSIONS
    FRENS, G
    [J]. NATURE-PHYSICAL SCIENCE, 1973, 241 (105): : 20 - 22
  • [8] Structure and morphology of self-assembled 3-mercaptopropyltrimethoxysilane layers on silicon oxide
    Hu, MH
    Noda, S
    Okubo, T
    Yamaguchi, Y
    Komiyama, H
    [J]. APPLIED SURFACE SCIENCE, 2001, 181 (3-4) : 307 - 316
  • [9] Josephson junctions defined by a nanoplough
    Irmer, B
    Blick, RH
    Simmel, F
    Godel, W
    Lorenz, H
    Kotthaus, JP
    [J]. APPLIED PHYSICS LETTERS, 1998, 73 (14) : 2051 - 2053
  • [10] Ab initio mechanistic study of the protection of alcohols and amines with anhydrides
    Kruger, HG
    [J]. JOURNAL OF MOLECULAR STRUCTURE-THEOCHEM, 2002, 577 (2-3): : 281 - 285