SiC(111) growth by C60 decomposition on Si(111) studied by electron spectroscopies

被引:5
作者
Pesci, A
Cepek, C
Sancrotti, M
Ferrari, L
Capozi, M
Perfetti, P
Pedio, M
机构
[1] CNR, ISM, Sede Distaccata Trieste, I-34012 Trieste, Italy
[2] Univ Trieste, Dipartimento Fis, I-34100 Trieste, Italy
[3] INFM, Lab Nazl TASC, I-34012 Trieste, Italy
[4] Univ Cattolica Sacro Cuore, INFM, I-25121 Brescia, Italy
[5] Univ Cattolica Sacro Cuore, Dipartimento Matemat & Fis, I-25121 Brescia, Italy
关键词
silicon carbide; carbon; silicon; low energy electron diffraction (LEED); growth;
D O I
10.1016/S0039-6028(01)00743-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have grown an ordered SiC(111) film, characterized by a (1 x 1) low energy electron diffraction (LEED) pattern, by evaporating C-60 molecules on a Si(111) substrate kept at 1200 K in ultrahigh vacuum conditions. In situ inverse photoemission spectra show the presence of a state at the conduction band minimum attributed to C-Si bond, whose intensity has been found to be related to the morphology of the grown film. We studied ex situ LEED, Si 2p and valence band photoemission spectra of the same SiC(111) sample as introduced in the vacuum chamber and after a sputtering/annealing treatment. After the cleaning procedure LEED shows clearly the recovering of the (1 x 1) pattern and the valence band spectra show the expected line shape for the SiC(111)-(1 x 1) sample. Evolution of the electronic configuration of the samples after Si evaporation will be discussed. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:829 / 835
页数:7
相关论文
共 17 条
[1]   Photoemission study of C60/Si(111) adsorption as a function of coverage and annealing temperature [J].
Cepek, C ;
Schiavuta, P ;
Sancrotti, M ;
Pedio, M .
PHYSICAL REVIEW B, 1999, 60 (03) :2068-2073
[2]   Growth mechanism of silicon carbide films on silicon substrates using C-60 carbonization [J].
Chen, D ;
Workman, R ;
Sarid, D .
SURFACE SCIENCE, 1995, 344 (1-2) :23-32
[3]   Study of the growth of fullerene-carbonized epitaxial SiC thin films by synchrotron radiation [J].
Geier, S ;
Zeitler, M ;
Helming, K ;
Philip, M ;
Henke, S ;
Stritzker, B ;
Rauschenbach, B .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1997, 64 (02) :139-141
[4]   GROWTH OF SILICON-CARBIDE FILMS VIA C-60 PRECURSORS [J].
HAMZA, AV ;
BALOOCH, M ;
MOALEM, M .
SURFACE SCIENCE, 1994, 317 (03) :L1129-L1135
[5]   Surface structure of 3C-SiC(111) grown on Si(111) surface by C-60 precursor [J].
Hu, CW ;
Kasuya, A ;
Suto, S ;
Wawro, A ;
Nishina, Y .
APPLIED PHYSICS LETTERS, 1996, 68 (09) :1253-1255
[6]   High-resolution core-level study of 6H-SiC(0001) [J].
Johansson, LI ;
Owman, F ;
Martensson, P .
PHYSICAL REVIEW B, 1996, 53 (20) :13793-13802
[7]   Electronic structure of 6H-SiC(0001) [J].
Johansson, LI ;
Owman, F ;
Martensson, P ;
Persson, C ;
Lindefelt, U .
PHYSICAL REVIEW B, 1996, 53 (20) :13803-13807
[8]   Electronic structure of the 6H-SiC(0001)-3 x 3 surface studied with angle-resolved inverse and direct photoemission [J].
Johansson, LSO ;
Duda, L ;
Laurenzis, M ;
Krieftewirth, M ;
Reihl, B .
SURFACE SCIENCE, 2000, 445 (01) :109-114
[9]   SURFACE-STRUCTURE AND COMPOSITION OF BETA-SIC AND 6H-SIC [J].
KAPLAN, R .
SURFACE SCIENCE, 1989, 215 (1-2) :111-134
[10]  
Martensson P, 1997, PHYS STATUS SOLIDI B, V202, P501, DOI 10.1002/1521-3951(199707)202:1<501::AID-PSSB501>3.0.CO