Updates on some technologies for c-Si based solar cells manufacturing

被引：2
|
作者：
Huang, Walt K. W. [1 ]
Chen, Tien-Szu [1 ]
Tsai, Ching-Tang [1 ]
Kuo, Ming-Chin [1 ]
Chang, Kai-Sheng [1 ]
Lin, Hung-Ming [1 ]
Chiou, Yan-Kai [1 ]
Wang, Chen-Chan [1 ]
Lin, Ming-Chun [1 ]
Wu, Chi-Sheng [1 ]
Chen, Zi-Jun [1 ]
Chen, Yi-Cin [1 ]
Tsai, Meng-Yen [1 ]
机构：
[1] Gintech Energy Copporat, Jhunan Township 350, Miaoli County, Taiwan
来源：
PROCEEDINGS OF THE SILICONPV 2011 CONFERENCE (1ST INTERNATIONAL CONFERENCE ON CRYSTALLINE SILICON PHOTOVOLTAICS) | 2011年 / 8卷
关键词：
solar cell; reactive ion etching; selective emitter; double print; light induced plating; SILICON; RIE;
D O I：
10.1016/j.egypro.2011.06.162
中图分类号：
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号：
0807 ; 0820 ;
摘要：
In this work, we demonstrate the cell efficiency improvements by means of some technologies, which include reactive ion etching (RIE) texturing, selective emitter (SE), double printing (DP), and light induced plating (LIP). Besides, some potential issues to transfer these technologies into mass production are also discussed. (C) 2010 Published by Elsevier Ltd. Selection and/or peer-review under responsibility of SiliconPV 2011.
引用
收藏
页码：435 / 442
页数：8
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