Embedded Barrier Layer for Reducing the Effect Out of Band Radiation in EUV Lithography

被引：0

作者：

Du, Ke ^{[1
]}

Siauw, Meiliana ^{[1
]}

Valade, David ^{[1
]}

Jasieniak, Marek ^{[2
]}

Voelcker, Nico ^{[2
]}

Trefonas, Peter ^{[3
]}

Thackeray, Jim ^{[3
]}

Blakey, Idriss ^{[1
]}

Whittaker, Andrew ^{[1
]}

机构：

[1] Univ Queensland, Australian Inst Bioengn & Nanotechnol, Brisbane, Qld 4072, Australia

[2] Univ South Australia, Ian Wark Res Inst, Mawson Lakes, SA 5095, Australia

[3] Dow Chem Co USA, 455 Forest St, Marlborough, MA 01752 USA

来源：

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIV | 2017年 / 10146卷

基金：

澳大利亚研究理事会;

关键词：

EUVL; OOB; Embedded Barrier Layer; RAFT polymerization; RAFT POLYMERIZATION; SURFACE-PROPERTIES; POLYMERS;

D O I：

10.1117/12.2270480

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Out of band (OOB) radiation from the EUV source has significant implications for the performance of EUVL photoresists. Here we introduce a surface-active polymer additive, capable of partitioning to the top of the resist film during casting and annealing, to protect the underlying photoresist from OOB radiation. Copolymers were prepared using reversible addition-fragmentation chain transfer (RAFT) polymerization, and rendered surface active by chain extension with a block of fluoro-monomer. Films were prepared from the EUV resist with added surface-active Embedded Barrier Layer (EBL), and characterized using measurements of contact angles and spectroscopic ellipsometry. Finally, the lithographic performance of the resist containing the EBL was evaluated using Electron Beam Lithography exposure.

引用

页数：7

共 16 条

[1] Recent progress in high resolution lithography
Bratton, D
Yang, D
Dai, JY
Ober, CK
[J]. POLYMERS FOR ADVANCED TECHNOLOGIES, 2006, 17 (02) : 94 - 103
[2] Controlled Radical (Co)polymerization of Fluoromonomers
Bruno, Ameduri
[J]. MACROMOLECULES, 2010, 43 (24) : 10163 - 10184
[3] Control through monomer placement of surface properties and morphology of fluoromethacrylate copolymers
Chen, Ao
Blakey, Idriss
Jack, Kevin S.
Whittaker, Andrew K.
Peng, Hui
[J]. JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 2015, 53 (22) : 2633 - 2641
[4] Fujitani N., 2014, P SOC PHOTO-OPT INS, V9048
[5] Fujitani N., 2013, NOVEL SOLUTION NEGAT
[6] Molecular aggregation structure and surface properties of poly(fluoroalkyl acrylate) thin films
Honda, K
Morita, M
Otsuka, H
Takahara, A
[J]. MACROMOLECULES, 2005, 38 (13) : 5699 - 5705
[7] Inukai K., 2012, EFFECTS OUT OF BAND
[8] Advances in RAFT polymerization: the synthesis of polymers with defined end-groups
Moad, G
Chong, YK
Postma, A
Rizzardo, E
Thang, SH
[J]. POLYMER, 2005, 46 (19) : 8458 - 8468
[9] End-functional polymers, thiocarbonylthio group removal/transformation and reversible addition-fragmentation-chain transfer (RAFT) polymerization
Moad, Graeme
Rizzardo, Ezio
Thang, San H.
[J]. POLYMER INTERNATIONAL, 2011, 60 (01) : 9 - 25
[10] Onishi R., 2012, NOVEL TOP COAT MAT R

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