-Ga2O3

被引:10
作者
Modak, Sushrut [1 ]
Chernyak, Leonid [1 ]
Schulte, Alfons [1 ]
Xian, Minghan [2 ]
Ren, Fan [2 ]
Pearton, Stephen J. [3 ]
Ruzin, Arie [4 ]
Kosolobov, Sergey S. [5 ]
Drachev, Vladimir P. [5 ,6 ]
机构
[1] Univ Cent Florida, Dept Phys, Orlando, FL 32816 USA
[2] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
[3] Univ Florida, Mat Sci & Engn, Gainesville, FL 32611 USA
[4] Tel Aviv Univ, Sch Elect Engn, IL-69978 Tel Aviv, Israel
[5] Skolkovo Inst Sci & Technol, Ctr Design Mfg & Mat, Nobel St,Bldg 1, Moscow 121205, Russia
[6] Univ North Texas, Dept Phys, Denton, TX 76203 USA
基金
美国国家科学基金会;
关键词
LUMINESCENCE; SEMICONDUCTORS; OXIDE;
D O I
10.1063/5.0073692
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Temperature dependent continuous and time-resolved cathodoluminescence measurements were employed to understand the luminescence from Si-doped beta-Ga2O3 prior to irradiation and after 10 MeV proton and 18 MeV alpha-particle irradiation. The shape and location of the luminescence components [ultraviolet luminescence (UVL & PRIME;) at 3.63 eV, UVL at 3.3 eV, and blue-luminescence at 2.96 eV] obtained from Gaussian decomposition did not change in either width or peak location, indicating that new radiation-induced trap-levels were non-radiative in nature between the 4.5 and 310 K temperature range. Activation energies, associated with thermal quenching of UVL & PRIME; and UVL bands, show temperature dependence, suggesting ionization of shallow Si-donors and a thermally activated non-radiative process.
引用
收藏
页数:6
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