Energy band states of an oxygen doped GeSbTe phase-change memory cell: Mechanism of low-voltage operation

被引:0
作者
Fujisaki, Yoshihisa [1 ]
Matsuzaki, Nozomu [1 ]
Kurotsuchi, Kenzo [1 ]
Morikawa, T. [1 ]
Kinoshita, M. [1 ]
Kitai, N. [2 ]
Hanzawa, Satoru [1 ]
Moriya, H. [3 ]
Takaura, Norikatsu [1 ]
Terao, M. [1 ]
Matsuoka, M.
Koga, Tsuyoshi [4 ]
Moniwa, M. [4 ]
机构
[1] Hitachi Ltd, Cent Res Lab, 1-280 Higashikoigakubao, Tokyo 1858601, Japan
[2] Hitachi USIL Syst, Tokyo 1858601, Japan
[3] Mech Engn Res Lab, Ibaraki 3120034, Japan
[4] Renesas Technol Corp, Itami, Hyogo 6640005, Japan
来源
MATERIALS AND PROCESSES FOR NONVOLATILE MEMORIES II | 2007年 / 997卷
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中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
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页码:293 / +
页数:2
相关论文
共 4 条
[1]  
[Anonymous], IEDM
[2]  
[Anonymous], S VLSI TECHN
[3]  
Matsui Y., 2006, IEDM
[4]  
Matsuzaki N., 2005, IEDM