Deposition of Colloidal Particles during the Evaporation of Sessile Drops: Dilute Colloidal Dispersions

被引:8
作者
Sung, Pei-Fang [1 ]
Wang, Lihui [1 ]
Harris, Michael T. [1 ]
机构
[1] Purdue Univ, Davidson Sch Chem Engn, W Lafayette, IN 47907 USA
关键词
DESORPTION; ADSORPTION; FLOW; DROPLETS; PATTERNS; SURFACE; FILMS; GLASS;
D O I
10.1155/2019/7954965
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
The deposition of colloidal silica particles during the evaporation of sessile drops on a smooth substrate has been modeled by the simultaneous solution of the Navier-Stokes equations, the convective-diffusive equation for particles, and the diffusion equation for evaporated vapor in the gas phase. Isothermal conditions were assumed. A mapping was created to show the conditions for various deposition patterns for very dilute suspensions. Based on values of the Peclet (Pe) number and Damkholer numbers (Da and Da(-1)), the effects of adsorption and desorption were discussed according to the map. Simulations were also done for suspensions with a high particle concentration to form a solid phase during the evaporation by using a packing criterion. The simulations predicted the height and width of the ring deposit near the contact line, and the results compared favorably to experimental particle deposition patterns.
引用
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页数:12
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