A Quasi-Two-Dimensional Threshold Voltage Model for Short-Channel Junctionless Double-Gate MOSFETs

被引:126
作者
Chiang, Te-Kuang [1 ]
机构
[1] Natl Univ Kaohsiung, Dept Elect Engn, Adv Devices Simulat Lab, Kaohsiung 700, Taiwan
关键词
Bulk conduction mode; junctionless (JL) doublegate MOSFETs; quasi-2-D scaling theory; threshold voltage; TRANSISTORS; NANOWIRE;
D O I
10.1109/TED.2012.2202119
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Based on the bulk conduction mode of the quasi-2-D scaling theory, an analytical threshold voltage model for short-channel junctionless (JL) double-gate MOSFETs is developed for the first time. The model explicitly shows how the device parameters such as the silicon thickness, oxide thickness, drain bias, and channel length affect the threshold voltage degradation. The model can also be extended to modeling accumulation/inversion operation mode for JL/junction-based double-gate MOSFETs. The model is verified by 2-D device simulations and can be easily used to explore the threshold voltage behavior of the JL double-gate MOSFETs due to its simple formula and computational efficiency.
引用
收藏
页码:2284 / 2289
页数:6
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