MOVPE of Large-Scale MoS2/WS2, WS2/MoS2, WS2/Graphene and MoS2/Graphene 2D-2D Heterostructures for Optoelectronic Applications

被引:14
作者
Grundmann, Annika [1 ]
McAleese, Clifford [2 ]
Conran, Ben Richard [2 ]
Pakes, Andrew [2 ]
Andrzejewski, Dominik [3 ]
Kuemmell, Tilmar [3 ]
Bacher, Gerd [3 ]
Khin Teo, Kenneth Boh [2 ]
Heuken, Michael [1 ,4 ]
Kalisch, Holger [1 ]
Vescan, Andrei [1 ]
机构
[1] Rhein Westfal TH Aachen, Compound Semicond Technol, Sommerfeldstr 18, D-52074 Aachen, Germany
[2] AIXTRON Ltd, Anderson Rd, Cambridge CB24 4FQ, England
[3] Univ Duisburg Essen, Werkstoffe Elektrotech & CENIDE, Bismarckstr 81, D-47057 Duisburg, Germany
[4] AIXTRON SE, Dornkaulstr 2, D-52134 Herzogenrath, Germany
关键词
VAPOR-PHASE EPITAXY; GROWTH; DISULFIDE;
D O I
10.1557/adv.2020.104
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Most publications on (opto)electronic devices based on 2D materials rely on single monolayers embedded in classical 3D semiconductors, dielectrics and metals. However, heterostructures of different 2D materials can be employed to tailor the performance of the 2D components by reduced defect densities, carrier or exciton transfer processes and improved stability. This translates to additional and unique degrees of freedom for novel device design. The nearly infinite number of potential combinations of 2D layers allows for many fascinating applications. Unlike mechanical stacking, metal-organic vapour phase epitaxy (MOVPE) can potentially provide large-scale highly homogeneous 2D layer stacks with clean and sharp interfaces. Here, we demonstrate the direct successive MOVPE of MoS2/WS2 and WS2/MoS2 heterostructures on 2 '' sapphire (0001) substrates. Furthermore, the first deposition of large-scale MoS2/graphene and WS2/graphene heterostructures using only MOVPE is presented and the influence of growth time on nucleation of WS2 on graphene is analysed.
引用
收藏
页码:1625 / 1633
页数:9
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