TEM Characterization of Near Sub-Grain Boundary Dislocations in Directionally Solidified Multicrystalline Silicon

被引:7
作者
Kivambe, Maulid [1 ]
Stokkan, Gaute [1 ]
Ervik, Torunn [1 ]
Ryningen, Birgit [2 ]
Lohne, Otto [1 ]
机构
[1] NTNU, Dept Mat Sci & Engn, N-7491 Trondheim, Norway
[2] SINTEF Mat & Chem, NO-7465 Trondheim, Norway
来源
GETTERING AND DEFECT ENGINEERING IN SEMICONDUCTOR TECHNOLOGY XIV | 2011年 / 178-179卷
关键词
dislocations; sub grain boundaries; mc-si; TEM; BEAM-INDUCED CURRENT; POLYCRYSTALLINE SILICON;
D O I
10.4028/www.scientific.net/SSP.178-179.307
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A crystal is known to achieve lower energy if lattice dislocations are re-arranged in arrays forming a sub-grain boundary through a recovery process. Interaction of boundary dislocations with glide dislocations is also expected to bring about local equilibrium. In this work, dislocations localized in the vicinity of a sub-grain boundary (misorientation< 5 degrees) are studied in detail by transmission electron microscopy in order to determine their source. Contrary to the processes described above, it appears that the sub-grain boundary is the source of these dislocations, which are emitted from some locally stressed parts of the boundary. Several slip systems have been activated along the boundary resulting in high density of dislocations. It appears, further, that dislocation propagation from one or more sources is disrupted by interaction with other dislocations or other defects. The dislocations from various sources will be piled up against the obstacles of the other, resulting in the localization of the dislocations close to the sub-grain boundary
引用
收藏
页码:307 / +
页数:3
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