PLASMA STREAMS MIXING IN TWO-CHANNEL T-SHAPED MAGNETIC FILTER

被引：0

作者：

Aksyonov, D. S. ^{[1
]}

Aksenov, I. I. ^{[1
]}

Luchaninov, A. A. ^{[1
]}

Reshetnyak, E. N. ^{[1
]}

Strel'nitskij, V. E. ^{[1
]}

机构：

[1] Kharkov Phys & Technol Inst, Natl Sci Ctr, UA-310108 Kharkov, Ukraine

来源：

PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY | 2011年 / 06期

关键词：

CATHODIC ARC; SYSTEM;

D O I：

暂无

中图分类号：

O57 [原子核物理学、高能物理学];

学科分类号：

070202 ;

摘要：

Ti-Al-N films were deposited by vacuum arc method. T-shaped magnetic filter with two channels was used for films preparation. Deposition was performed after aluminum and titanium separate plasma streams from two plasma sources were mixed into single one inside plasma duct having weakened magnetic field near its output. Obtained films have uniform distribution of composition and thickness on 180 mm diameter substrate surface. It was found that mixing and homogenization degree depends on nitrogen pressure, output magnetic field intensity and output-to-substrate distance. Film self-sputtering and aluminum preferential sputtering were observed for elevated negative substrate bias potentials.

引用

页码：116 / 120

页数：5

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