Fabrication of nanograined silicon carbide by ultrahigh-pressure hot isostatic pressing

被引:2
作者
Shinoda, Y [1 ]
Nagano, T
Wakai, F
机构
[1] Japan Sci & Technol Corp, IICORP, Ceram Superplast Project, Nagoya, Aichi 4568587, Japan
[2] Tokyo Inst Technol, Ctr Mat Design, Mat & Struct Lab, Yokohama, Kanagawa 2268503, Japan
关键词
D O I
暂无
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Dense nanograined SiC ceramics were obtained by using hot isostatic pressing (HIP). The starting powder was ultrafine beta-SiC powder, which had a mean particle size of 30 nm and contained 3.5 wt % free carbon. SiC powders-both boron-doped and undoped-were densified via HIP under an ultrahigh pressure of 980 MPa at a temperature of 1600 degrees C. Both doped and undoped SiC attained the same density (3.12 g/cm(3)) (relative density of 97.1%). The average grain sizes of boron-doped and undoped SiC were 200 and 30 nm, respectively. The compressive flow stress of undoped SiC was 3 times higher than that of boron-doped SIC at temperatures of 1800 degrees and 1700 degrees C; however, the flow stresses of both materials were almost the same at 1600 degrees C. The HIPed SiC that was doped with boron could be deformed at a stress that was one-third lower than that of hot-pressed boron- and carbon-doped SIC with a grain size of 0.8 mu m.
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页码:771 / 773
页数:3
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