The Role of Surface Roughness in Plasmonic-Assisted Internal Photoemission Schottky Photodetectors

被引:62
作者
Grajower, Meir [1 ]
Levy, Uriel [1 ]
Khurgin, Jacob B. [2 ]
机构
[1] Hebrew Univ Jerusalem, Ctr Nanosci & Nanotechnol, Benin Sch Engn & Comp Sci, Dept Appl Phys, IL-91904 Jerusalem, Israel
[2] Johns Hopkins Univ, Dept Elect & Comp Engn, Baltimore, MD 21218 USA
关键词
plasmonics; photodetectors; Schottky barrier; internal photoemission; surface enhancement; scattering; HOT-ELECTRON PHOTODETECTION; HIGH-PERFORMANCE; DETECTORS; RESPONSIVITY; INTERFACE; INJECTION; DIODES; REGIME; BAND; IR;
D O I
10.1021/acsphotonics.8b00643
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Internal photoemission of charged carriers from metal to semiconductors plays an important role in diverse fields such as sub-bandgap photodetectors and catalysis. Typically, the quantum efficiency of this process is relatively low, posing a stringent limitation on its applicability. Here, we show that the efficiency of hot carrier injection from a metal into a semiconductor across a Schottky barrier can be enhanced by as much as an order of magnitude in the presence of surface roughness on the scale of a few atomic layers. Our results are obtained using a simple semianalytical theory and indicate that properly engineered plasmonic-assisted internal photoemission photodetectors can be a viable alternative in silicon photonics. Other applications, such as plasmonic-enhanced photocatalysis, can also benefit from these results.
引用
收藏
页码:4030 / 4036
页数:13
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