Particle emission from a tungsten test limiter in TEXTOR-94: a comparison between experimental and Monte Carlo simulated results

被引:3
作者
Ohya, K
Kawata, J
Tanabe, T
Wada, M
Ohgo, T
Philipps, V
Unterberg, B
Pospieszczyk, A
Schweer, B
Huber, A
Noda, N
机构
[1] Univ Tokushima, Fac Engn, Tokushima 7708506, Japan
[2] Takuma Natl Coll Technol, Takuma 7691192, Japan
[3] Nagoya Univ, Ctr Integrated Res Sci & Engn, Nagoya, Aichi 4648603, Japan
[4] Doshisha Univ, Dept Elect, Kyoto 6100394, Japan
[5] Fukuoka Univ Educ, Dept Phys, Fukuoka 8114192, Japan
[6] Forschungszentrum Julich, Inst Plasmaphys, Ass Euratom KFA, D-52425 Julich, Germany
[7] Natl Inst Fus Sci, Gifu 5095292, Japan
关键词
plasma-material interaction; TEXTOR; high-Z material; tungsten; impurity release; Monte Carlo simulation;
D O I
10.1016/S0022-3115(98)00594-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The release of deuterium and impurity atoms from a W test limiter exposed to the edge plasma of TEXTOR is studied both experimentally and by means of Monte Carlo simulations. Experimentally, spatial intensity distributions of D gamma, CII, OII and WI line spectra emission are observed around the limiter, whereas the particle release from the limiter is simulated combining the TRIDYN model with a transport model of released particles in the plasma. Good agreement is found in spatial distributions between experimentally observed WI line intensity and simulated ionization events of physically sputtered W atoms. The observed Dy line emission is attributed to the re-emission of very low-energy (similar to 0.1 eV) D atoms, the energy of which depends on the limiter temperature. Low-energy C and O atoms are also observed probably due to chemical sputtering or surface reaction of implanted (deposited) impurities producing hydrocarbons and volatile oxides. The observed CII and OII line emissions at a distance more than about I cm from the limiter surface are influenced by the physical sputtering of impurities deposited from the background plasma on the W limiter. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:629 / 634
页数:6
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