Photoluminescence properties of ZnO thin films grown by electrochemical deposition

被引:16
作者
Kim, D [1 ]
Terashita, T [1 ]
Tanaka, I [1 ]
Nakayama, M [1 ]
机构
[1] Osaka City Univ, Grad Sch Engn, Dept Appl Phys, Sumiyoshi Ku, Osaka 5588585, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 2003年 / 42卷 / 8A期
关键词
ZnO; thin film; electrochemical deposition; thermal treatment; P emission;
D O I
10.1143/JJAP.42.L935
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have investigated the photoluminescence properties of ZnO thin films grown by electrochemical deposition. By applying a thermal treatment at 500degreesC in O-2 atmosphere, a free-exciton photoluminescence is observed. Furthermore, under high-density excitation conditions, a photoluminescence band appears on the low-energy side of the free exciton. The photoluminescence intensity exhibits an almost quadratic dependence on the excitation power, and the energy spacing between the photoluminescence band and the free exciton is almost equal to the exciton binding energy of ZnO. We conclude from the above results that the photoluminescence band under high-density excitation conditions originates from an inelastic scattering process of excitons, the so-called P emission.
引用
收藏
页码:L935 / L937
页数:3
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