RF Power Potential of 45 nm CMOS Technology

被引:16
作者
Gogineni, Usha [1 ]
del Alamo, Jesus A. [1 ]
Putnam, Christopher [2 ]
机构
[1] MIT, 77 Massachusetts Ave, Cambridge, MA 02139 USA
[2] IBM Microelect, Essex Jct, VT 10504 USA
来源
2010 TOPICAL MEETING ON SILICON MONOLITHIC INTEGRATED CIRCUITS IN RF SYSTEMS | 2010年
关键词
D O I
10.1109/SMIC.2010.5422960
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents the first measurements of the RF power performance of 45 nm CMOS devices with varying device widths and layouts. We find that 45 nm CMOS can deliver a peak output power density of around 140 mW/mm with a peak power-added efficiency (PAE) of 70% at 1.1 V. The PAE and P-out, decrease with increasing device width because of a decrease in the maximum oscillation frequency (f(max)) for large width devices. The PAE also decreases with increasing frequency because of a decrease in gain as the operating frequency approaches f(max). The RF power performance of 45 nm devices is shown to be very similar to that of 65 nm devices.
引用
收藏
页码:204 / +
页数:2
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