Development of molecular resists based on Phenyl[4] calixarene derivativesyy

被引：5

作者：

Echigo, Masatoshi ^{[1
]}

Hayashi, Hiromi ^{[1
]}

Oizumi, Hiroaki ^{[2
]}

Matsumaro, Kazuyuki ^{[2
]}

Itani, Toshiro ^{[2
]}

机构：

[1] Mitsubishi Gas Chem Co Inc, Hiratsuka Res Labs, 6-2 Higashi Yawata,5 Chome, Hiratsuka, Kanagawa 2540016, Japan

[2] Semicond Leading Edge Technol Inc, Tsukuba, Ibaraki 3058569, Japan

来源：

ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVII, PTS 1 AND 2 | 2010年 / 7639卷

关键词：

Calix[4] resorcinarene; molecular resist; positive-tone; negative-tone; EB; EUV; lithography; LER; LWR;

D O I：

10.1117/12.846475

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have developed negative-tone molecular resist based on C-4-cyclohexylphenylcalix[4] resorcinarene(MGR108) and positive-tone molecular resist based on protected C-4-isopropylphenylcalix[4] resorcinarene (MGR104P). Both MGR108 and MGR104P showed high solubility in both conventional resist solvents such as propylene glycol monomethyl ether and conventional alkaline developer of 0.26N TMAHaq. In this paper, we show current performance of resists by EB lithography (EBL) and EUV lithography (EUVL).

引用

页数：9

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