XPS study on the correlation between chemical state and oxygen-sensing properties of an iron oxide thin film

被引：60

作者：

Aronniemi, A. ^{[1
]}

Sainio, J. ^{[1
]}

Lahtinen, J. ^{[1
]}

机构：

[1] Helsinki Univ Technol, Phys Lab, FI-02015 Helsinki, Finland

来源：

APPLIED SURFACE SCIENCE | 2007年 / 253卷 / 24期

基金：

芬兰科学院;

关键词：

XPS; iron oxide; thin film; gas sensor; oxygen; factor analysis; chemical state;

D O I：

10.1016/j.apsusc.2007.06.007

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We have studied the correlation between the chemical state and the oxygen-sensing properties of an iron oxide thin film using a setup that allows simultaneous sensor resistance measurements and X-ray photoelectron spectroscopy (XPS) data acquisition. The gas exposures were performed at the highest operating pressure of the XPS spectrometer at a controlled sample temperature which allows direct comparison between the sensor response and the chemical state of the surface. The iron oxide film was modified by a sequence of argon ion sputtering steps and the induced changes in the chemical state, resistance, and sensitivity to oxygen were investigated. The sputtering was found to reduce the iron from the Fe3+ to the Fe2+ state and to decrease the sensor resistance. The measured sensitivity to oxygen first increased by a factor of two but then collapsed to its original level. The mechanism for oxygen sensing was found to be filling of the oxygen vacancies in the lattice. The effect of the sputtering on the resistance and sensitivity could be explained first with an increase in the density of oxygen vacancies and then, as the iron became more reduced, with an increase in the p-type conductivity. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：9476 / 9482

页数：7

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