Plasma filtration of vacuum arc droplets

被引：0

作者：

Shanin, PM ^{[1
]}

Koval, NN ^{[1
]}

Kozirev, AV ^{[1
]}

Goncharenko, IM ^{[1
]}

Langner, J ^{[1
]}

Grigoriev, SV ^{[1
]}

机构：

[1] Russian Acad Sci, Inst High Current Elect, Siberian Div, Tomsk 634055, Russia

来源：

ISDEIV: XIXTH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM, VOLS 1 AND 2, PROCEEDINGS | 2000年 / 19卷

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Theoretical and experimental studies have been performed on the effect of the gas-discharge plasma on the vacuum are droplet fraction arriving at the sample in plasma-assisted deposition of TiN coatings. It has been shown that the number of droplets on a negatively biased sample decreases four or five times if the droplet flow passes through the plasma of a low-pressure non-self-sustained are discharge having a higher electron temperature than the plasma of the vacuum are. Possible mechanisms for the observed plasma filtration of the droplet fraction of a vacuum are are discussed.

引用

页码：590 / 593

页数：4

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