Single Event Transients in Sub-10nm SOI MuGFETs Due to Heavy-Ion Irradiation

被引:10
作者
Jha, Chandan Kumar [1 ]
Aditya, Kritika [1 ]
Gupta, Charu [1 ]
Gupta, Anshul [1 ]
Dixit, Abhisek [1 ]
机构
[1] IIT Delhi, Dept Elect Engn, New Delhi 110016, India
关键词
FinFETs; Semiconductor process modeling; Mathematical model; Radiation effects; Solid modeling; Logic gates; Silicon; Heavy-ion; nanosheet (NS); silicon on insulator single event transient; linear energy transfer (LET); BIPOLAR AMPLIFICATION; NANOWIRE FETS; TECHNOLOGY; SIMULATION; MOSFETS; PERFORMANCE; TRANSISTORS; INSIGHTS; ENERGY; SI;
D O I
10.1109/TDMR.2020.2985029
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We compare and report in this work heavy-ion irradiation induced single event transients (SETs) in sub-10nm node SOI multiple gate FETs with the help of calibrated 3-D TCAD simulations. Our analysis includes the nanosheet FET (NSFET), nanowire FET (NWFET), and FinFET along with two different device design modes based on the doping profiles, namely the inversion (INV) and junctionless mode (JL). We have also analyzed the impact of heavy-ion strike direction and angle of incidence on SET performance of various MuGFETs. Heavy-ion induced SET current has also been compared for multiple-sheet/wires of NSFET and NWFET. In addition to this, different locations of heavy-ion strike have also been considered in this work. Further, we have collated the simulation trends to propose empirical models that predict the impact of heavy-ion radiation on various MuGFETs. Our models include some of the device design parameters and heavy-ion exposure conditions as the input to the model. The proposed models are shown to correlate well with the TCAD simulation results for the set of model parameters that we have reported here. These models not only expedite the analysis, but these can also accurately predict SETs in advanced MuGFETs under heavy-ion irradiation.
引用
收藏
页码:395 / 403
页数:9
相关论文
共 37 条
[1]   Transient Response of 0.18-μm SOI MOSFETs and SRAM Bit-Cells to Heavy-Ion Irradiation for Variable SOI Film Thickness [J].
Aditya, Kritika ;
Jha, Chandan K. ;
Basra, Sanjeev ;
Jatana, H. S. ;
Dixit, Abhisek .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2018, 65 (11) :4826-4833
[2]  
Anil KG, 2005, 2005 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERS, P198
[3]   SEU Prediction From SET Modeling Using Multi-Node Collection in Bulk Transistors and SRAMs Down to the 65 nm Technology Node [J].
Artola, Laurent ;
Hubert, Guillaume ;
Warren, Kevin M. ;
Gaillardin, Marc ;
Schrimpf, Ronald D. ;
Reed, Robert A. ;
Weller, Robert A. ;
Ahlbin, Jonathan R. ;
Paillet, Philippe ;
Raine, Melanie ;
Girard, Sylvain ;
Duzellier, Sophie ;
Massengill, Lloyd W. ;
Bezerra, Francoise .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2011, 58 (03) :1338-1346
[4]   3-D LER and RDF Matching Performance of Nanowire FETs in Inversion, Accumulation, and Junctionless Modes [J].
Bansal, Anil K. ;
Gupta, Charu ;
Gupta, Anshul ;
Singh, Ramendra ;
Hook, Terence B. ;
Dixit, Abhisek .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2018, 65 (03) :1246-1252
[5]   Series Resistance Reduction in Stacked Nanowire FETs for 7-nm CMOS Technology [J].
Bansal, Anil Kumar ;
Jain, Ishita ;
Hook, Terence B. ;
Dixit, Abhisek .
IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2016, 4 (05) :266-272
[6]   Variable Depth Bragg Peak Method for Single Event Effects Testing [J].
Buchner, S. ;
Kanyogoro, N. ;
McMorrow, D. ;
Foster, C. C. ;
O'Neill, Patrick M. ;
Nguyen, Kyson V. .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2011, 58 (06) :2976-2982
[7]   Analysis of 45-nm multi-gate transistors behavior under heavy ion irradiation by 3-D device simulation [J].
Castellani-Coulie, K. ;
Munteanu, D. ;
Autran, J. L. ;
Ferlet-Cavrois, V. ;
Paillet, P. ;
Baggio, J. .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2006, 53 (06) :3265-3270
[8]   Investigation of 30 nm gate-all-around MOSFET sensitivity to heavy ions:: A 3-D simulation study [J].
Castellani-Coulie, K. ;
Munteanu, D. ;
Autran, J. L. ;
Ferlet-Cavrois, V. ;
Paillet, P. ;
Baggio, J. .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2006, 53 (04) :1950-1958
[9]   Simulation analysis of the bipolar amplification in fully-depleted SOI technologies under heavy-ion irradiations [J].
Castellani-Coulié, K ;
Munteanu, D ;
Ferlet-Cavrois, V ;
Autran, JL .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2005, 52 (05) :1474-1479
[10]  
Dixit A., 2010, U.S. Patent, Patent No. [8 258 577, 8258577]