Three-additive model of superfilling of copper

被引:147
作者
Cao, Y [1 ]
Taephaisitphongse, P [1 ]
Chalupa, R [1 ]
West, AC [1 ]
机构
[1] Columbia Univ, Dept Chem Engn, New York, NY 10027 USA
关键词
D O I
10.1149/1.1377898
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
A model describing the effect of an accelerator bis(3-sulfopropyl)disulfide (SPS) and the two inhibitors poly(ethylene glycol) and Janus Green B (PEG and JGB) on the leveling efficacy on submicrometer trenches of an acid-copper plating bath ir described, simulated, and compared to experimental fill studies. All parameters of the model are estimated from electrochemical measurements on a nonpatterned, rotating disk electrode. A multicomponent version of a Frumkin isotherm is employed to account fur the interaction between SPS and PEG, and the interaction between PEG and JOB are described by a competitive adsorption. Langmuir model. Shape-change simulations employing these descriptions of the surface phenomena are consistent with fill studies over a large range of SPS and JGB concentrations; however, simulations do not predict the result that void-free deposits are achieved when the concentration of JGB is zero. (C) 2001 The Electrochemical Society. [DOI: 10.1149/1.1377898] All rights reserved.
引用
收藏
页码:C466 / C472
页数:7
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