The optical spectra of a-Si:H and a-SiC:H thin films measured by the absolute photothermal deflection spectroscopy (PDS)

被引:15
作者
Remes, Zdenek [1 ]
Vasudevan, Ravi [2 ]
Jarolimek, Karol [2 ]
Smets, Arno H. M. [2 ]
Zeman, Miro [2 ]
机构
[1] Delft Univ Technol, Photovolta Mat & Devices Lab DIMES, NL-2600 GA Delft, Netherlands
[2] Acad Sci Czech Republ, Inst Phys, Prague 16253, Czech Republic
来源
PHYSICS AND TECHNOLOGY OF NANOSTRUCTURED MATERIALS II | 2014年 / 213卷
关键词
photothermal deflection spectrosocopy; amorphous silicon; Tauc gap; Urbach edge; SILICON; ABSORPTION;
D O I
10.4028/www.scientific.net/SSP.213.19
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The new absolute PDS setup allows to measure simultaneously the absolute values of the optical transmittance T, reflectance R and absorptance A spectra in the spectral range 280 - 2000 nm with the typical spectral resolution 10 nm in ultraviolet and visible spectral range and 20 nm in the near infrared region. The PDS setup provides the dynamic detection range in the optical absorptance up to 4 orders of magnitude using non-toxic liquid perfluorohexane Fluorinert FC72. Here we demonstrate the usability of this setup on a series of intrinsic as well as doped a-Si: H and a-SiC:H thin films deposited on glass substrates by radio frequency (RF) plasma enhanced chemical vapor deposition (CVD) from hydrogen, silane and methane under various conditions. The increase of the Tauc gap with increasing carbon concentration in intrinsic a-SiC:H was observed. The defect-induced localized states in the energy gap were observed in doped a-Si:H as well as undoped a-SiC:H below the Urbach absorption edge.
引用
收藏
页码:19 / +
页数:2
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