Fabrication of Sub-100 nm Sized Patterns on Curved Acryl Substrate Using a Flexible Stamp

被引：22

作者：

Hong, Sung-Hoon ^{[1
]}

Han, Kang-Soo ^{[1
]}

Byeon, Kyeong-Jae ^{[1
]}

Lee, Heon ^{[1
]}

Choi, Kyung-Woo ^{[2
]}

机构：

[1] Korea Univ, Div Engn & Mat Sci, Seoul 136701, South Korea

[2] Korea Inst Nucl Safety, Taejon 305338, South Korea

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2008年 / 47卷 / 05期

关键词：

curved substrate; flexible stamp; nickel foil stamp; hot embossing; nanoimprint;

D O I：

10.1143/JJAP.47.3699

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

As small as 100nm patterns were successfully transferred onto a non-planar acryl substrate using both UV nanoimprinting and hot embossing techniques. Two different types of flexible imprint stamps, electroformed nickel foil stamp and molded water soluble poly(vinyl alcohol) (PVA) stamp, were used. 100 nm line and space pattern of Si master was successfully transferred to nickel foil stamp and PVA stamp and their patterns were also transferred to the surface of curved acryl substrate using either UV nanoimprint lithography or hot embossing lithography. [DOI: 10.1143/JJAP.47.3699]

引用

页码：3699 / 3701

页数：3

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