Modification of electronic band structure in mL plus nL (m=1, 2; n=1-5) free-stacking graphene

被引:1
作者
Ji, Jianting [1 ]
He, Rui [2 ]
Jie, Yinghao [1 ]
Zhang, Anmin [1 ]
Ma, Xiaoli [1 ]
Pan, Linjing [1 ]
Wang, Le [1 ]
Zhang, Liyuan [1 ]
Zhang, Qing-Ming [1 ]
机构
[1] Renmin Univ China, Beijing Key Lab Optoelect Funct Mat & Micronano D, Dept Phys, Beijing 100872, Peoples R China
[2] Univ Northern Iowa, Dept Phys, Cedar Falls, IA 50614 USA
基金
美国国家科学基金会;
关键词
TWISTED BILAYER GRAPHENE; CHEMICAL-VAPOR-DEPOSITION; RAMAN-SPECTROSCOPY; DEFECTS; MODES;
D O I
10.1063/1.4964706
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this paper, we studied stacked mL + nL graphene layers using Raman scattering spectroscopy. Our results indicate that the 2D band from stacked graphene can be considered as a superposition of those from the constituent nL and mL graphene layers, and a blueshift in the 2D band is observed when n or m = 1. The blueshift increases with the number of stacked layers and can be well understood by the reduction of Fermi velocity in the single layer graphene, as studied in the 1L + 1L (or twisted bilayer) case. As the number of stacked layers changes from 1 to 5, the Fermi velocity in the single layer graphene reduces to about 85% of its initial value. This study shows a convenient way to realize the modification of the Fermi velocity in free-stacking graphene and is of significance to the applications of graphene-based heterostructures. Published by AIP Publishing.
引用
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页数:4
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