Nanopatterning on silicon surface using atomic force microscopy with diamond-like carbon (DLC)-coated Si probe

被引:46
作者
Jiang, Xiaohong [1 ]
Wu, Guoyun [1 ]
Zhou, Jingfang [2 ]
Wang, Shujie [1 ]
Tseng, Ampere A. [3 ]
Du, Zuliang [1 ]
机构
[1] Henan Univ, Minist Educ, Key Lab Special Funct Mat, Kaifeng 475004, Peoples R China
[2] Univ S Australia, Ian Wark Res Inst, Mawson Lakes, SA 5095, Australia
[3] Arizona State Univ, Sch Engn Matter Transport & Energy, Tempe, AZ 85287 USA
来源
NANOSCALE RESEARCH LETTERS | 2011年 / 6卷
基金
中国国家自然科学基金;
关键词
NANOLITHOGRAPHY; LITHOGRAPHY; OXIDATION; FILMS; DEVICES; SCRATCH; TIP;
D O I
10.1186/1556-276X-6-518
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Atomic force microscope (AFM) equipped with diamond-like carbon (DLC)-coated Si probe has been used for scratch nanolithography on Si surfaces. The effect of scratch direction, applied tip force, scratch speed, and number of scratches on the size of the scratched geometry has been investigated. The size of the groove differs with scratch direction, which increases with the applied tip force and number of scratches but decreases slightly with scratch speed. Complex nanostructures of arrays of parallel lines and square arrays are further fabricated uniformly and precisely on Si substrates at relatively high scratch speed. DLC-coated Si probe has the potential to be an alternative in AFM-based scratch nanofabrication on hard surfaces.
引用
收藏
页码:1 / 7
页数:7
相关论文
共 29 条
[1]   Ultrahigh-density atomic force microscopy data storage with erase capability [J].
Binnig, G ;
Despont, M ;
Drechsler, U ;
Häberle, W ;
Lutwyche, M ;
Vettiger, P ;
Mamin, HJ ;
Chui, BW ;
Kenny, TW .
APPLIED PHYSICS LETTERS, 1999, 74 (09) :1329-1331
[2]   Controllable room-temperature metallic quantum dot [J].
Bitton, L ;
Frydman, A .
APPLIED PHYSICS LETTERS, 2006, 88 (11)
[3]   Nanopatterning of Si/SiGe electrical devices by atomic force microscopy oxidation [J].
Bo, XZ ;
Rokhinson, LP ;
Yin, HZ ;
Tsui, DC ;
Sturm, JC .
APPLIED PHYSICS LETTERS, 2002, 81 (17) :3263-3265
[4]   Fabrication of metal nanowires by atomic force microscopy nanoscratching and lift-off process [J].
Chen, YJ ;
Hsu, JH ;
Lin, HN .
NANOTECHNOLOGY, 2005, 16 (08) :1112-1115
[5]   Abbreviated MOVPE nucleation of III-nitride light-emitting diodes on nano-patterned sapphire [J].
Ee, Yik-Khoon ;
Li, Xiao-Hang ;
Biser, Jeff ;
Cao, Wanjun ;
Chan, Helen M. ;
Vinci, Richard P. ;
Tansu, Nelson .
JOURNAL OF CRYSTAL GROWTH, 2010, 312 (08) :1311-1315
[6]   Metalorganic Vapor Phase Epitaxy of III-Nitride Light-Emitting Diodes on Nanopatterned AGOG Sapphire Substrate by Abbreviated Growth Mode [J].
Ee, Yik-Khoon ;
Biser, Jeffrey M. ;
Cao, Wanjun ;
Chan, Helen M. ;
Vinci, Richard P. ;
Tansu, Nelson .
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 2009, 15 (04) :1066-1072
[7]   Metal layer mask patterning by force microscopy lithography [J].
Fonseca, HD ;
Maurício, MHP ;
Ponciano, CR ;
Prioli, R .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2004, 112 (2-3) :194-199
[8]   A Rotating-Tip-Based Mechanical Nano-Manufacturing Process: Nanomilling [J].
Gozen, B. Arda ;
Ozdoganlar, O. Burak .
NANOSCALE RESEARCH LETTERS, 2010, 5 (09) :1403-1407
[9]   Preparation of variable-thickness MgB2 thin film bridges by AFM nanolithography [J].
Gregor, M ;
Plecenik, A ;
Plecenik, T ;
Tomasek, M ;
Kus, P ;
Micunek, R ;
Stefecka, M ;
Zahoran, M ;
Grancic, B ;
Kubinec, M ;
Gasparik, V .
PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS, 2006, 435 (1-2) :82-86
[10]   In-plane gates and nanostructures fabricated by direct oxidation of semiconductor heterostructures with an atomic force microscope [J].
Held, R ;
Vancura, T ;
Heinzel, T ;
Ensslin, K ;
Holland, M ;
Wegscheider, W .
APPLIED PHYSICS LETTERS, 1998, 73 (02) :262-264