Atomic Rearrangements and Photoemission Processes at a p-GaN(Cs)-Vacuum Interface

被引:0
作者
Bakin, V. V. [1 ]
Kosolobov, S. N. [1 ]
Rozhkov, S. A. [1 ,2 ]
Scheibler, H. E. [1 ,2 ]
Terekhov, A. S. [1 ]
机构
[1] Russian Acad Sci, Siberian Branch, Rzhanov Inst Semicond Phys, Novosibirsk 630090, Russia
[2] Novosibirsk State Univ, Novosibirsk 630090, Russia
基金
俄罗斯基础研究基金会;
关键词
NEGATIVE ELECTRON-AFFINITY; P-GAN(0001) SURFACES; GAAS-CS; PHOTOELECTRONS; PHOTOCATHODE; ADSORPTION; STATES;
D O I
10.1134/S0021364018150031
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Spontaneous changes in photoemission properties of a ?-GaN(Cs)-vacuum interface with effective negative electronic affinity induced by rearrangements of its atomic structure have been studied for the first time. The optimum Cs coating that ensures both the maximum photoelectron escape probability and its stability has been found. A thermodynamic model has been proposed to escape the relation of the photoemission properties of the ?-GaN(Cs)-vacuum interface to its free energy and entropy.
引用
收藏
页码:180 / 184
页数:5
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