Valley blockade and multielectron spin-valley Kondo effect in silicon

被引:13
|
作者
Crippa, A. [1 ,2 ]
Tagliaferri, M. L. V. [1 ,2 ]
Rotta, D. [1 ,2 ]
De Michielis, M. [2 ]
Mazzeo, G. [1 ,2 ]
Fanciulli, M. [1 ,2 ]
Wacquez, R. [3 ]
Vinet, M. [3 ]
Prati, E. [2 ,4 ]
机构
[1] Univ Milano Bicocca, Dipartimento Sci Mat, I-20125 Milan, Italy
[2] CNR IMM, Lab MDM, I-20864 Agrate Brianza, MB, Italy
[3] CEA Grenoble, CEA LETI MINATEC, F-38054 Grenoble, France
[4] CNR, Ist Foton & Nanotecnol, I-20133 Milan, Italy
关键词
QUANTUM-DOT; SUPPRESSION;
D O I
10.1103/PhysRevB.92.035424
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report on the valley blockade and the multielectron Kondo effect generated by an impurity atom in a silicon nanofield effect device. According to the spin-valley nature of tunneling processes, and consistently with those allowed by the valley blockade regime, the manifestation of Kondo effect at occupation N = 1,2,3 has the periodicity 4 of the electron filling sequence typical of silicon. The spin-valley Kondo effect emerges under different kinds of screening depending on the electron filling. By exploiting the valley blockade regime, valley index conservation in the Kondo SU(4) is deduced with no need of an external magnetic field. Microwave irradiation suppresses the Kondo effect at occupancies up to three electrons.
引用
收藏
页数:11
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