Characterization of the optical and structural properties for low-emissivity filters with Ti, TiOx, and ITO barrier layers

Low-emissivity (low-e) filters with the multiple repetition of a basic [TiO2 vertical bar barrier layer vertical bar Ag vertical bar TiO2] structure were designed for display applications and fabricated by using radio-frequency magnetron sputtering. The effects of Ti, TiOx, and ITO film barrier layers protecting the Ag thin films on the optical and electrical properties of the low-e filters were investigated by using various analytical tools. It is found that filters with TiOx and ITO barrier layers show higher transmittance in the visible, better NIB, cutoff ability, and a smoother surface than those with Ti metal barrier layers, suggesting that the ITO and TiOx films can be used as good barrier layers for low-e filters.