Thickness-dependent fracture behaviour of flexible ZnO : Al thin films

被引:35
作者
Mohanty, Bhaskar Chandra [1 ]
Choi, Hong Rak [1 ]
Choi, Yong Muk [1 ]
Cho, Yong Soo [1 ]
机构
[1] Yonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea
关键词
CRACKING; STRAIN; SUBSTRATE; COATINGS; OXIDE;
D O I
10.1088/0022-3727/44/2/025401
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effects of thickness on flexibility and crack initiation in ZnO : Al thin films sputter-deposited on polyethersulfone substrates have been investigated. With an increase in thickness, root-mean-square roughness and average crystallite size increase linearly. It is found that the higher the thickness, the lower is the strain required to initiate cracks in the film. The thinnest film (similar to 240 nm) exhibits a crack-initiating critical strain of 0.96% and a saturated crack density of 0.10 mu m(-1). A critical energy release rate of 68.5 Jm(-2) and a mode I fracture toughness of 3.2MPam(0.5) are estimated for the films. These parameters are found to exhibit a linear dependence on film thickness.
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页数:6
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