Characterization and modeling of gate-induced-drain-leakage

被引:21
作者
Gilibert, F
Rideau, D
Dray, A
Agut, F
Minondo, M
Juge, A
Masson, P
Bouchakour, R
机构
[1] STMicroelect, Cent R&D, Device Modeling 850, F-38926 Crolles, France
[2] Univ Aix Marseille 1, L2MP UMR CNRS 6137, F-13397 Marseille, France
关键词
GIDL; compact model; MOSFET; electric field; trap assisted tunneling;
D O I
10.1093/ietele/e88-c.5.829
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present measurements of Gate-Induced-Drain-Leakage at various temperatures and terminal biases. Besides Band-to-Band tunneling leakage observed at high Drain-to-Gate voltage V-DG, we also observed Trap-Assisted-Tunneling leakage current at lower V-DG. Based on ISE TCAD simulations of the electric field, we propose analytical models for Band-to-Band and Trap-Assisted Gate-Induced-Drain-Leakage currents suitable for compact modeling.
引用
收藏
页码:829 / 837
页数:9
相关论文
共 24 条
[1]  
DUNGA MV, 2001, IEEE P 8 IPFA SING, P254
[2]  
Furlan J., 1999, J MODEL SIMUL MICROS, V1, P109
[3]   A three-terminal band-trap-band tunneling model for drain engineering and substrate bias effect on GIDL in MOSFET [J].
Guo, JC ;
Liu, YC ;
Chou, MH ;
Wang, MT ;
Shone, F .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1998, 45 (07) :1518-1523
[4]  
Hurkx G. A. M., 1989, P INT ELECTRON DEVIC, P307
[5]   A NEW ANALYTICAL DIODE MODEL INCLUDING TUNNELING AND AVALANCHE BREAKDOWN [J].
HURKX, GAM ;
DEGRAAFF, HC ;
KLOOSTERMAN, WJ ;
KNUVERS, MPG .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1992, 39 (09) :2090-2098
[6]  
*ISE TCAD, 2003, DESSIS US MAN REL 9
[7]   UNIFIED APPARENT BANDGAP NARROWING IN NORMAL-TYPE AND PARA-TYPE SILICON [J].
KLAASSEN, DBM ;
SLOTBOOM, JW ;
DEGRAAFF, HC .
SOLID-STATE ELECTRONICS, 1992, 35 (02) :125-129
[8]   A comprehensive study of inversion current in MOS tunneling diodes [J].
Lin, CH ;
Hsu, BC ;
Lee, MH ;
Liu, CW .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2001, 48 (09) :2125-2130
[9]  
MEI X, 2001, BSIM 4 2 1 USERS MAN
[10]  
MII T, 1992, P IEDM 92 NOV, P155