Deposition and Characterization of CdS, CuS and ZnS Thin Films Deposited by SILAR Method

被引:33
作者
Guzeldir, B. [1 ]
Saglam, M. [1 ]
Ates, A. [2 ]
机构
[1] Ataturk Univ, Fac Sci, Dept Phys, Erzurum, Turkey
[2] Univ Yildirim Beyazit, Fac Eng & Nat Sci, Dept Mat Engn, Ankara, Turkey
关键词
ELECTRICAL CHARACTERISTICS;
D O I
10.12693/APhysPolA.121.33
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Cadmium sulfide, copper sulfide and zinc sulfide films were grown on Si(111) substrate by successive ionic layer adsorption and reaction method at room temperature. The crystalline structure and morphology of obtained films were characterized by X-ray diffraction, scanning electronic microscope and energy dispersive X-ray analysis methods. The films were polycrystalline and showed preferred orientation. The surface morphology of these films looked relatively smooth and homogeneous in the scanning electron microscope image. The energy dispersive X-ray analysis spectra showed that the expected elements exist in the thin films.
引用
收藏
页码:33 / 35
页数:3
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