Vacuum actuated gas delivery

被引：0

作者：

Olander, WK ^{[1
]}

Donatucci, M ^{[1
]}

Mayer, J ^{[1
]}

Wan, LP ^{[1
]}

机构：

[1] ATMI Inc, Danbury, CT 06810 USA

来源：

2000 INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY, PROCEEDINGS | 2000年

关键词：

D O I：

暂无

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

The new Vacuum Actuated Cylinder (VAC (TM)) gas source provides sub-atmospheric pressure delivery of the metal fluorides commonly used as dopants for ion implant. The VAC gas source is a mechanical system based on an embedded pressure control device located inside the cylinder. A pre-set sub-atmospheric pressure must be achieved in the delivery manifold before flow is permitted from the cylinder. Even with the primary cylinder valve open, if the threshold activation pressure is not achieved, flow does not occur. This paper describes the VAC gas source technology, its operation and features that include improved safety and storage capacity. A detailed discussion of the testing procedures, results and future plans is also included.

引用

页码：722 / 725

页数：4