Impact of pressure on carbon films by PECVD toward high deposition rates and high stability as metallic bipolar plate for PEMFCs

被引:58
作者
Che, Ju [1 ]
Yi, Peiyun [1 ]
Peng, Linfa [1 ]
Lai, Xinmin [2 ]
机构
[1] Shanghai Jiao Tong Univ, State Key Lab Mech Syst & Vibrat, Shanghai 200240, Peoples R China
[2] Shanghai Jiao Tong Univ, Shanghai Key Lab Digital Manufacture Thin Walled, Shanghai 200240, Peoples R China
基金
国家重点研发计划; 中国国家自然科学基金;
关键词
PEMFCs; Amorphous carbon coating; PECVD; Deposition pressure; Carbon structure; High deposition rates; MEMBRANE FUEL-CELLS; STAINLESS-STEEL; CORROSION-RESISTANCE; COATINGS; XPS; DEGRADATION; PERFORMANCE; TECHNOLOGY; RATIO;
D O I
10.1016/j.ijhydene.2020.04.078
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Stainless-steel bipolar plates (BPPs) are widely used in place of graphite bipolar plates in proton exchange membrane fuel cells (PEMFCs). Amorphous hydrogenated carbon (a-C:H) coatings are widely used to improve the conductivity and corrosion resistance of metal bipolar plates. However, a-C:H coatings prepared by the sputtering method cannot be applied to quantity production on account of its low deposition rate. Our paper focuses on a-C:H coatings applied at metallic BPPs for PEMFCs produced by direct-current plasma-enhanced chemical vapor deposition (DC-PECVD) with high deposition rates. The effects of adjusting deposition pressures on the structure and properties of coatings have been investigated. The results show that the a-C:H coating deposited at 8 Pa deposition pressure have high stability, with a high deposition rate of 37.5 nm/min. As the deposition pressure increased, sp(2)-hybridized carbon atoms increased, the larger microcrystalline carbon clusters are found, and the structure will undergo different structural transformations in a-C:H coatings. Overall, the a-C:H coatings deposited at 8 Pa are attractive to be applied in metallic bipolar plate with have high deposition rates, dense coating structure, and proper carbon structure. (C) 2020 Hydrogen Energy Publications LLC. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:16277 / 16286
页数:10
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