Study of a chemical-vapor-deposited diamond thin film on a molybdenum substrate by glancing incidence X-ray diffraction

被引:1
|
作者
Fang, Jianfeng [1 ]
Huo, Jing [1 ]
Zhang, Jinyuan [1 ]
Zheng, Yi [1 ]
机构
[1] Cent Iron & Steel Res Inst, Dept Powder Met, Beijing 100081, Peoples R China
关键词
glancing incidence X-ray diffraction; diamond thin film; thickness determination;
D O I
10.1154/1.2790933
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The structure of a chemical-vapor-deposited (CVD) diamond thin film on a Mo substrate was studied using quasi-parallel X-ray and glancing incidence techniques. Conventional X-ray diffraction analysis revealed that the sample consists of a diamond thin film, a Mo2C transition layer, and Mo substrate. The Mo2C transition layer was formed by a chemical reaction between the diamond film and the Mo substrate during the CVD process. A method for layer-thickness determination of the thin film and the transition layer was developed. This method was based on a relationship between X-ray diffraction intensities from the transition layer or its substrate and a function of grazing incidence angles. Results of glancing incidence X-ray diffraction analysis showed that thicknesses of the diamond thin film and the Mo2C transition layer were determined successfully with high precision. (C) 2007 International Centre for Diffraction Data.
引用
收藏
页码:319 / 323
页数:5
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