The strong correlation of the 4f electrons of erbium in silicon

被引:14
作者
Fu, Y [1 ]
Huang, Z [1 ]
Wang, X [1 ]
Ye, L [1 ]
机构
[1] Fudan Univ, Surface Phys Lab, Shanghai 200433, Peoples R China
关键词
D O I
10.1088/0953-8984/15/9/307
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The local spin density approximation (LSDA) with the Hubbard model correction is adopted to describe the electronic structures of O-codoped Er-Si systems. The electrons in the 4f orbitals of Er atoms are taken as localized electrons in the framework of an all-electron treatment. The total density of states (DOS) and the partial densities of states for Si(3s, 3p), Er(4f), Er(5d), Er(6s), O(2s), and O(2p) in this ErSiO system are calculated. It is found that the inclusion of the Hubbard U greatly influences the partial DOS of the Er 4f electrons. The separation between the spin-up and the spin-down states of the highly localized 4f orbitals is larger than that of the LSDA results obtained without considering the Hubbard U-parameter. The calculation results provide possible explanations of the experimentally observed erbium-induced impurity energy levels in Si detected by deep-level transient spectroscopy.
引用
收藏
页码:1437 / 1444
页数:8
相关论文
共 21 条
[1]  
ALDER DL, 1992, APPL PHYS LETT, V61, P2182
[2]   BAND THEORY AND MOTT INSULATORS - HUBBARD-U INSTEAD OF STONER-I [J].
ANISIMOV, VI ;
ZAANEN, J ;
ANDERSEN, OK .
PHYSICAL REVIEW B, 1991, 44 (03) :943-954
[3]   THE ELECTRICAL AND DEFECT PROPERTIES OF ERBIUM-IMPLANTED SILICON [J].
BENTON, JL ;
MICHEL, J ;
KIMERLING, LC ;
JACOBSON, DC ;
XIE, YH ;
EAGLESHAM, DJ ;
FITZGERALD, EA ;
POATE, JM .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (05) :2667-2671
[4]   Erbium-doped silicon epilayers grown by liquid-phase epitaxy [J].
Binetti, S ;
Cavallini, A ;
Dellafiore, A ;
Fraboni, B ;
Grilli, E ;
Guzzi, M ;
Pizzini, S ;
Sanguinetti, S .
JOURNAL OF LUMINESCENCE, 1998, 80 (1-4) :347-351
[5]   Electron paramagnetic resonance of erbium doped silicon [J].
Carey, JD ;
Donegan, JF ;
Barklie, RC ;
Priolo, F ;
Franzo, G ;
Coffa, S .
APPLIED PHYSICS LETTERS, 1996, 69 (25) :3854-3856
[6]   Deep levels in Er-doped liquid phase epitaxy grown silicon [J].
Cavallini, A ;
Fraboni, B ;
Pizzini, S .
APPLIED PHYSICS LETTERS, 1998, 72 (04) :468-470
[7]   Electrical and optical analyses of Er-doped silicon grown by liquid-phase epitaxy [J].
Cavallini, A ;
Fraboni, B ;
Pizzini, S ;
Binetti, S ;
Lazzarini, L ;
Salviati, G .
JOURNAL OF LUMINESCENCE, 1998, 80 (1-4) :343-346
[8]   DESCRIPTION OF THE TRENDS FOR RARE-EARTH IMPURITIES IN SEMICONDUCTORS [J].
DELERUE, C ;
LANNOO, M .
PHYSICAL REVIEW LETTERS, 1991, 67 (21) :3006-3009
[9]   1.54-MU-M LUMINESCENCE OF ERBIUM-IMPLANTED III-V SEMICONDUCTORS AND SILICON [J].
ENNEN, H ;
SCHNEIDER, J ;
POMRENKE, G ;
AXMANN, A .
APPLIED PHYSICS LETTERS, 1983, 43 (10) :943-945
[10]   1.54 mu m photoluminescence of Er3+ doped into SiO2 films containing Si nanocrystals: Evidence for energy transfer from Si nanocrystals to Er3+ [J].
Fujii, M ;
Yoshida, M ;
Kanzawa, Y ;
Hayashi, S ;
Yamamoto, K .
APPLIED PHYSICS LETTERS, 1997, 71 (09) :1198-1200