Direct nano-scale patterning of Ag films using hard X-ray induced oxidation

被引：4

作者：

Kim, Jae Myung ^{[1
,2
]}

Lee, Su Yong ^{[3
]}

Kang, Hyon Chol ^{[4
]}

Noh, Do Young ^{[1
,2
]}

机构：

[1] Gwangju Inst Sci & Technol, Dept Phys & Photon Sci, Kwangju 500712, South Korea

[2] Gwangju Inst Sci & Technol, Sch Mat Sci & Engn, Kwangju 500712, South Korea

[3] Pohang Accelerator Lab, Pohang Light Source, Pohang 790834, South Korea

[4] Chosun Univ, Dept Mat Sci & Engn, Kwangju 501759, South Korea

来源：

JOURNAL OF SYNCHROTRON RADIATION | 2015年 / 22卷

基金：

新加坡国家研究基金会;

关键词：

hard X-ray focusing; Fresnel zone plate; X-ray lithography; PLASMON RESONANCE; TALBOT; LITHOGRAPHY; FABRICATION; ARRAYS;

D O I：

10.1107/S1600577514023534

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The morphological change of silver nano-particles (AgNPs) exposed to an intense synchrotron X-ray beam was investigated for the purpose of direct nano-scale patterning of metal thin films. AgNPs irradiated by hard X-rays in oxygen ambient were oxidized and migrated out of the illuminated region. The observed X-ray induced oxidation was utilized to fabricate nano-scale metal line patterns using sectioned WSi2/Si multilayers as masks. Lines with a width as small as 21 nm were successfully fabricated on Ag films on silicon nitride. Au/Ag nanolines were also fabricated using the proposed method.

引用

页码：156 / 160

页数：5

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