The role of adsorbed alkali metal atoms in the enhancement of surface reactivity: A scanning tunneling microscopy study of low coverage K/Si(111)7x7 surfaces

被引：18

作者：

Gorelik, D ^{[1
]}

Aloni, S ^{[1
]}

Eitle, J ^{[1
]}

Meyler, D ^{[1
]}

Haase, G ^{[1
]}

机构：

[1] Weizmann Inst Sci, Dept Chem Phys, IL-76100 Rehovot, Israel

来源：

JOURNAL OF CHEMICAL PHYSICS | 1998年 / 108卷 / 23期

关键词：

D O I：

10.1063/1.476426

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Atomically resolved surface photovoltage imaging and tunneling barrier imaging were performed with a scanning tunneling microscope to elucidate the nature of the initial adsorption state of potassium on room temperature Si(111)7 x 7 surface, which appears as a missing center Si-adatom. No evidence was found to-support the fact that this adsorption mode is charged. K islands start to grow (and accumulate at 7 x 7 domain boundaries) already at coverages as low as 4 x 10(12) cm(-2). These islands may be responsible for the previously reported work function lowering and enhanced chemical reactivity upon K deposition. (C) 1998 American Institute of Physics.

引用

页码：9877 / 9884

页数：8

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