Hopping charge transport in hydrogenated amorphous silicon-germanium alloy thin films

被引:3
|
作者
Stolik, L. [1 ]
Eslamisaray, M. A. [2 ]
Nguyen, E. [1 ]
Kortshagen, U. R. [2 ]
Kakalios, J. [1 ]
机构
[1] Univ Minnesota, Sch Phys & Astron, Minneapolis, MN 55455 USA
[2] Univ Minnesota, Dept Mech Engn, Minneapolis, MN 55455 USA
基金
美国国家科学基金会;
关键词
ELECTRON-SPIN-RESONANCE; LOCALIZED PI-ELECTRONS; CONDUCTIVITY CHANGES; COULOMB GAP; THERMOPOWER; ENERGY; DETECTORS; MECHANISM; STATES;
D O I
10.1063/5.0077441
中图分类号
O59 [应用物理学];
学科分类号
摘要
Measurements of the dark conductivity and thermoelectric power in hydrogenated amorphous silicon-germanium alloys (a-Si1-xGex:H) reveal that charge transport is not well described by an Arrhenius expression. For alloys with concentrations of Ge below 20%, anomalous hopping conductivity is observed with a power-law exponent of 3/4, while the temperature dependence of the conductivity of alloys with higher Ge concentrations is best fit by a combination of anomalous hopping and a power-law temperature dependence. The latter has been attributed to charge transport via multi-phonon hopping. Corresponding measurements of the Seebeck coefficient reveal that the thermopower is n-type for the purely a-Si:H and a-Ge:H samples but that it exhibits a transition from negative to positive values as a function of the Ge content and temperature. These findings are interpreted in terms of conduction via hopping through either exponential band tail states or dangling bond defects, suggesting that the concept of a mobility edge, accepted for over five decades, may not be necessary to account for charge transport in amorphous semiconductors. Published under an exclusive license by AIP Publishing.
引用
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页数:11
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