Extrinsic structure changes by STM at 65 K on Si(001)

被引:46
作者
Mitsui, T
Takayanagi, K
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
[2] Japan Sci & Technol Corp, ERATO, Takayanagi Particle Surface Project, Akishima, Tokyo 196, Japan
[3] Tokyo Inst Technol, Dept Mat Sci & Engn, Midori Ku, Yokohama, Kanagawa 227, Japan
关键词
D O I
10.1103/PhysRevB.62.R16251
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Using variable-temperature scanning tunneling microscopy to image buckled dimers in a C(4 x 2) phase on Si(001) at 65 K under conventional scanning conditions, we have observed symmetric dimers in the P(2 x 1) phase and the flip-flop motion of dimers at the boundary of two different phases. Careful investigation shows that higher tunneling currents produce larger areas of P(2 x 1) phase and higher flip-flop rates of individual dimers. We have measured and plotted the flip-flop rate as a function of current. The origin of the phase transition and the flip-flop dimer motion are discussed.
引用
收藏
页码:R16251 / R16254
页数:4
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