Charge-enhancement mechanisms of GaAs field-effect transistors: Experiment and simulation

被引:23
作者
McMorrow, D
Melinger, JS
Knudson, AR
Buchner, S
Tran, LH
Campbell, AB
Curtice, WR
机构
[1] USN, Res Lab, Washington, DC 20375 USA
[2] WR Curtice Consulting, Princeton Junction, NJ 08550 USA
关键词
D O I
10.1109/23.685229
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The charge-collection processes of GaAs field-effect transistors are investigated as a function of the incident laser pulse energy via time-resolved charge-collection measurements and by two-dimensional computer simulation. The measurements and simulations reveal a feature that persists on a time scale of 100 ps, the amplitude of which varies strongly with the injected carrier density (pulse energy). The appearance of this feature is associated with a barrier lowering effect at the source/substrate junction, coupled with the drift-assisted transport of electrons through the substrate to the drain contact. This behavior is similar, but not identical to bipolar-gain models that have been suggested previously. We introduce the concept of ion-track segments and illustrate their utility in interrogating the complex mechanisms of charge collection and enhancement in GaAs FETs.
引用
收藏
页码:1494 / 1500
页数:7
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