Computer modelling of defect structure and rare earth doping in LiCaAlF6 and LiSrAlF6

被引:26
作者
Amaral, JB
Plant, DF
Valerio, MEG
Jackson, RA [1 ]
机构
[1] Univ Keele, Sch Chem & Phys, Lennard Jones Labs, Keele ST5 5BG, Staffs, England
[2] Univ Fed Sergipe, Dept Fis, BR-49100000 Sao Cristovao, SE, Brazil
关键词
D O I
10.1088/0953-8984/15/17/308
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
This paper describes a computational study of the mixed metal fluorides LiCaAlF6 and LiSrAlF6, which have potential technological applications when doped with a range of elements, especially those from the rare earth series. Potentials are derived to represent the structure and properties of the undoped materials, then defect properties are calculated, and finally solution energies for rare earth elements are calculated, enabling preferred dopant sites and charge compensation mechanisms to be predicted.
引用
收藏
页码:2523 / 2533
页数:11
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