Synthetic study of Al-Ni alloy system using HVEM and ion accelerator

被引:1
作者
Kinoshita, H
Takahashi, H
Gotthardt, R
机构
[1] Hokkaido Univ, CARET, Kita Ku, Sapporo, Hokkaido 0608628, Japan
[2] Ecole Polytech Fed Lausanne, CH-1015 Lausanne, Switzerland
关键词
Al-Ni system; ion implantation; metastable phases; amorphous phase;
D O I
10.1016/S0254-0584(03)00038-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The microstructure changes of aluminum under implantation with Ni+ ions were investigated. The ion implantation was carried out at 250 keV Needle-like precipitates were formed in the Al matrix after implantation to 0.2 x 10(17) Ni+ cm(-2). This precipitate contained between 8.5 and 13.3 at.% Ni. The growth of the precipitates was connected with an amorphous phase under further implantation up to 2 x 10(17) Ni+ cm(-2). The concentration of Ni in the, amorphous phase was 10.8-12.8 at.%. In order to investigate the phase stability of the precipitate, annealing or electron irradiation experiments were performed in a high voltage electron microscope. The crystalline and the amorphous phases were stable under electron irradiation up to 5 dpa. The crystalline phases were also stable during annealing at 673 K, whereas the amorphous phase was crystallized during annealing at 593 K. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:424 / 426
页数:3
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