Electropolishing of copper alloys in phosphoric acid solutions with alcohols

被引：0

作者：

Pircher, E ^{[1
]}

Martínez, MR ^{[1
]}

Hansal, S ^{[1
]}

Hansal, W ^{[1
]}

机构：

[1] ECHEM Kompetenzzentrum Angew Electrochem GmbH, A-2700 Wiener Neustadt, Austria

来源：

PLATING AND SURFACE FINISHING | 2003年 / 90卷 / 05期

关键词：

D O I：

暂无

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

The electrochemical polishing process of ternary copper alloys (15% Mn, 15% Zn) in phos phoric acid-based electrolytes has been studied. The effects of phosphoric. acid concentration and the presence of different alcohols (methanol, ethanol, propanol and butanol) in the polishing electrolyte, on the polarization diagrams and the metal removal rate were studied. Additionally, Hull cell tests were carried out in order to investigate the relationship between the appearance of the polished surfaces and the current density. The polished surfaces were characterized by environmental scanning electron microscopy and atomic force microscopy.

引用

页码：74 / 79

页数：6

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