Continued progress on a low cost high current density Mono Element Internal Tin conductor (MEIT) with integral barriers

被引:10
作者
Zeitlin, BA [1 ]
Gregory, E
Pyon, T
Scanlan, RM
机构
[1] Supergen LLC, Sarasota, FL 34242 USA
[2] Supergen LLC, Jefferson, MA 01522 USA
[3] Outokumpu Adv Superconductors, Waterbury, CT 06704 USA
[4] Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA
关键词
critical current density; critical field; internal tin; niobium tin; superconductors;
D O I
10.1109/TASC.2003.812364
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Progress on Mono Element Internal Tin superconductor is presented for four designs with two incorporating integral Nb barriers as opposed to NbTa barriers added later in the fabrication. Processing information is also presented covering the fabrication of these conductors. Sample testing techniques are discussed that gave stable reproducible results to 10 T at current densities of 3767 A/mm(2) (noncopper). Current density as a function of magnetic field-from 10 to 17 T is measured and analyzed with respect to heat treatment and configuration. A value of 2700 A/mm(2) in the noncopper at 12 T was achieved in the best though nonoptimized samples. Kramer plots are also presented that show H* of up to 26 T. Reported "n" values are 33 at 17 T for the highest current density sample.
引用
收藏
页码:3482 / 3485
页数:4
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