Electron knock-on damage in hexagonal boron nitride monolayers

被引:237
作者
Kotakoski, J. [1 ]
Jin, C. H. [2 ,3 ]
Lehtinen, O. [1 ]
Suenaga, K. [2 ]
Krasheninnikov, A. V. [1 ,4 ]
机构
[1] Univ Helsinki, Div Mat Phys, FIN-00014 Helsinki, Finland
[2] Natl Inst Adv Ind Sci & Technol, Nanotube Res Ctr, Tsukuba, Ibaraki 3058565, Japan
[3] Meijo Univ, Dept Mat Sci & Engn, Tenpaku Ku, Nagoya, Aichi 4688502, Japan
[4] Aalto Univ, Dept Appl Phys, Aalto 00076, Finland
基金
芬兰科学院;
关键词
D O I
10.1103/PhysRevB.82.113404
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We combine first-principles molecular-dynamics simulations with high-resolution transmission electron microscopy experiments to draw a detailed microscopic picture of irradiation effects in hexagonal boron nitride (h-BN) monolayers. We determine the displacement threshold energies for boron and nitrogen atoms in h-BN, which differ significantly from the tight-binding estimates found in the literature and remove ambiguity from the interpretation of the experimental results. We further develop a kinetic Monte Carlo model which allows to extend the simulations to macroscopic time scales and make a direct comparison between theory and experiments. Our results provide a comprehensive picture of the response of h-BN nanostructures to electron irradiation.
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页数:4
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