Pattern formation in a thin solid film with interactions

被引:157
作者
Shenoy, V [1 ]
Sharma, A
机构
[1] Indian Inst Technol, Dept Mech Engn, Kanpur 208016, Uttar Pradesh, India
[2] Indian Inst Technol, Dept Chem Engn, Kanpur 208016, Uttar Pradesh, India
关键词
D O I
10.1103/PhysRevLett.86.119
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We investigate a new type of surface instability of a thin elastic film subjected to surface interactions such as van der Waals and electrostatic forces from another solid surface in its vicinity. It is found that a sufficiently soft (shear modulus <10 MPa) and nearly incompressible film deforms to form an undulating pattern without any mass transport. A novel feature is that the characteristic length scale of the pattern is nearly independent of the nature and magnitude of the external force, but varies linearly with the film thickness. These results explain some recent experiments and an applicable to problems such as adhesion and friction at soft solid interfaces, peeling of adhesives, patterning of solid surfaces, etc.
引用
收藏
页码:119 / 122
页数:4
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