Picosecond Laser Patterning of ITO Thin Films

被引：36

作者：

Risch, Anna ^{[1
]}

Hellmann, Ralf ^{[1
]}

机构：

[1] Univ Appl Sci Aschaffenburg, D-63743 Aschaffenburg, Germany

来源：

LASERS IN MANUFACTURING 2011: PROCEEDINGS OF THE SIXTH INTERNATIONAL WLT CONFERENCE ON LASERS IN MANUFACTURING, VOL 12, PT B | 2011年 / 12卷

关键词：

Picosecond Laser; Laser Patterning; ITO; Indium Tin Oxide; INDIUM-TIN OXIDE; ABLATION; PLASMA; FEMTOSECOND; WAVELENGTHS; PULSES; LAYER; GLASS; AIR;

D O I：

10.1016/j.phpro.2011.03.115

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present a comparative study of picosecond laser patterning of ITO thin films for OLED applications using 355 nm, 532 nm and 1064 nm radiation. Front side and rear side patterning was investigated and single pulse ablation thresholds were determined for all three wavelengths and both irradiation sides. Good ablation quality was achieved by using 1064 nm front side irradiation resulting in a smooth groove bottom, almost vanishing ridges at the groove rims and a neglectable heat affected zone.

引用

页码：133 / 140

页数：8

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