III-Nitride Polymorphs: XN (X=Al, Ga, In) in the Pnma Phase

被引:55
作者
Fan, Qingyang [1 ]
Zhang, Wenzhu [1 ]
Yun, Sining [2 ]
Xu, Jie [1 ]
Song, Yanxing [3 ]
机构
[1] Xian Univ Architecture & Technol, Sch Informat & Control Engn, Xian 710055, Shaanxi, Peoples R China
[2] Xian Univ Architecture & Technol, FML, Sch Mat & Mineral Resources, Xian 710055, Shaanxi, Peoples R China
[3] Xidian Univ, Sch Microelect, Xian 710071, Shaanxi, Peoples R China
基金
中国国家自然科学基金;
关键词
density functional theory; elastic anisotropy; electronic properties; nitride polymorphs; Pnma phase; HIGH-PRESSURE PHASES; COUNTER ELECTRODES; ELASTIC PROPERTIES; BORON-NITRIDE; 1ST-PRINCIPLES; BN; ALN; STABILITY; PERFORMANCE; SCATTERING;
D O I
10.1002/chem.201803202
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The structural, mechanical, elastic anisotropy, and electronic properties, together with the stability, effective mass of holes and electrons for XN (X=Al, Ga, In) in the Pnma phase are investigated by using density functional theory calculations. The elastic constants and the phonon spectra all manifest III-nitride polymorphs: XN (X=Al, Ga, In) in the Pnma phase in this work are mechanically and dynamically stable at ambient pressure. Al atoms, Ga atoms, and In atoms lead to new electrical and band-gap properties: XN (X=Al, Ga, In) in the Pnma phase are all semiconductor materials with direct band gaps of 4.76 eV, 2.80 eV, and 0.66 eV, respectively, which present great application potentials in the new generation electronic devices such as ultraviolet detectors, visible light detectors, infrared detectors, violet-light diodes, and light-emitting diodes.
引用
收藏
页码:17280 / 17287
页数:8
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