Characterization of fluorinated silica thin films with ultra-low refractive index deposited at low temperature

被引：15

作者：

Abbasi-Firouzjah, Marzieh ^{[3
]}

Shokri, Babak ^{[1
,2
]}

机构：

[1] Shahid Beheshti Univ, Laser & Plasma Res Inst, Tehran 1983963113, Iran

[2] Shahid Beheshti Univ, Dept Phys, Tehran 1983963113, Iran

[3] Semnan Sci & Technol Pk, Shahrood 3614933578, Iran

来源：

THIN SOLID FILMS | 2015年 / 577卷

关键词：

Ultra-low refractive index; Fluorinated silica film; Moisture absorption; Nano-void; Ellipsometry; CHEMICAL-VAPOR-DEPOSITION; OXIDE FILMS; PLASMA; DIOXIDE; PECVD; DIETHOXYMETHYLSILANE; SPECTROSCOPY; PARAMETERS; SYSTEM; ARRAY;

D O I：

10.1016/j.tsf.2015.01.041

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Structural and optical properties of low refractive index fluorinated silica (SiOxCyFz) films were investigated. The films were deposited on p-type silicon and polycarbonate substrates by radio frequency plasma enhanced chemical vapor deposition method at low temperatures. A mixture of tetraethoxysilane vapor, oxygen, and CF4 was used for deposition of the films. The influence of oxygen flow rate on the elemental compositions, chemical bonding states and surface roughness of the films was studied using energy dispersive X-ray analyzer, Fourier transform infrared spectroscopy in reflectance mode and atomic force microscopy, respectively. Effects of chemical bonds of the film matrix on optical properties and chemical stability were discussed. Energy dispersive spectroscopy showed high fluorine content in the SiOxCyFz film matrix which is in the range of 7.6-11.3%. It was concluded that in fluorine content lower than a certain limit, chemical stability of the film enhances, while higher contents of fluorine heighten moisture absorption followed by increasing refractive index. All of the deposited films were highly transparent. Finally, it was found that the refractive index of the SiOxCyFz film was continuously decreased with the increase of the O-2 flow rate down to the minimum value of 1.16 +/- 0.01 (at 632.8 nm) having the most ordered and nano-void structure and the least organic impurities. This sample also had the most chemical stability against moisture absorption. (C) 2015 Elsevier B.V. All rights reserved.

引用

页码：67 / 73

页数：7

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